Liquid Photoresist for Roller Coating Machines
PID:
2102379
Model No:
Made in:
Taiwan
Quantity:
1000 Piece(s)Available
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Supplier Details
FOREVER STAR ELECTRONICS CO., LTD.
Member Since
1998
Address
6F, 534, Minsheng N. Rd. Sec. 1, Gueishan District, Taoyuan City, Taiwan
+886-3-3124361
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Key Features
Forever Star Electronics Co., Ltd. offered LONGLITE® liquid photoresist is a negative, water-soluble, alkali developing type and UV sensitive liquid photopolymer. It is designed for both horizontal and vertical roller coating machines with excellent resolution and adhesion, which is suitable for acid etching PCBs. Contact us NOW for best liquid photoraesist solution.
Product Details
LONGLITE® liquid photo resist is a blue color, negative-working, alkali developing type, UV sensitive liquid photopolymer. It is designed for Horizontal Type & Vertical Type Roller Coater in mass production of fine line PCB. It is applicable to acidic etching process.
Features
1. Excellent resolution
2. Excellent adhesion and conformation ability
3. Wider operation window in development
4. Easy stripping
5. Good chemical resistance
6. Good for board stacking
7. High image contrast after exposure
Specification
Mass Production Operation Conditions
Coating
| Resist Thickness | 10-15 m (Dried) |
Exposure
| Step of Stouffer Sensitivity Guide 21 Step | 5-7 Step |
Development
| Developer | Na2CO3 0.8-1.2 % |
| Temperature | 26-30°C |
| Developing Time (BP=50%) | 12-15 sec |
Etching
| Acidic Etch Ant | Cupric Chloride, Ferric Chloride |
Stripping
| Stripper | NaOH 2-4 % |
| Temperature | 45-50°C |
| Stripping Time | <30 sec |
Attachment
